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NIKON日本尼康MM-400/800LM測量顯微鏡
NIKON日本尼康MM-400/800LM測量顯微鏡
Nikon is proud to present the MM-400/800 series of Measuring Microscopes, which incorporate key performance featuresexpected in an advanced next generation measuring microscope:
For Large Stroke Stage (Max, 300mm x 200mm x 200mm)
MM-800/LM: Motorized Z Axis
MM-800/L: Built-in Z Linear Scale
MM-800/: 2 axes measurement model
MM-800/S: For 3rd Party DRO
MM-800/SL: For 3rd Party DRO with Built-in Z Linear Scale
For Smaller Stroke Stage (Max, 150mm x 100mm x 150mm)
MM-400/LM: Motorized Z Axis
MM-400/L: Built-in Z Linear Scale
MM-400/: 2 axes measurement model
MM-400/S: For 3rd Party DRO
MM-400/SL: For 3rd Party DRO with Built-in Z Linear Scale
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New 300mm x 200mm Stage
Add body strength enables the use of larger stages, such as the newly developed PS12x8C stages, allowing for larger workpieces.
MM Controller Backpack Interface
Illumination, X/Y stage and Z data can be connected to the MM Controller as an interface to an external computer running E-Max software for data processing and system control.
All White LED Illuminators
High-intensity white LED illuminator is provided as standard for brightfield use . This illuminator feature no bulb replacement and constant color temperature, enabling measurement with high-precision and efficiency.
Non-Contact Height Measurement Technology FA Head TTL Laser AF for Universal Epi-Illuminator.
TTL Laser AF (Universal Type)
This Laser AF system features a 0.5 second focusing speed with a repeatability as high as 0.5µm.
Focusing Aid (FA)
The newly developed split-prism Focusing Aid(FA) delivers sharp patterns to allow accurate focusing during Z-axis measurements.
Measurements errors due to differences in the depth of focus of different objectives are minimized.
Laser AF Tracking on FPC
Focused
Front focus
Rear focus
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These "Universal" models combine a measuring stand with the best of Nikon's metallurgicalmicroscope components for high resolution imaging and critical measurements. Featuring thefull range of Nikon advanced LU objectives and microscopy techniques including: brightfield,darkfield, DIC contrast, polarizing and epi-fluorescence. Up to five objectives may bemounted on the nosepiece. Moreover, important controls in the microscope-e.g. Z-axismovement, focusing and illumination switchover-have been automated or motorized tostreamline imaging operations such as digital image capture, digital field-of-viewmeasurement and data storage.
Applications:
Semiconductor packages, Bonding placement, Loop height, FPD panel (LCM) MEMS, Wafer level CSP, HDD slider
Metalized Patterns of FPC
FFD - Cell Process
CCD
Color Filter
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