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X射線波帶片

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公司名稱 八帆儀器設備（上海）有限公司
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更新時間 2021/1/5 16:55:38
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2020年01月08日至 2020年02月08日

特價促銷

模內澆口分離自動化，降低對人的依賴度；傳統(tǒng)的塑膠模具開模后產品與澆口相連特點，需二道工序進行人工剪切分離積極回應，模內熱切模具將澆口分離提前至開模前，消除后續(xù)工序又進了一步，有利于生產自動化多種場景，降低對人的依賴。

詳細信息在線詢價

具有25nm分辨率的波帶片的SEM圖像

X-Ray波帶片

高質量的X射線光學系統(tǒng)規劃，具有經過驗證的分辨率擴大公共數據、效率和可靠性、低成本帶動擴大，適用于ptychography核心技術體系、STXM、TXM和相位對比成像的軟X射線和硬X射線持續發展。

優(yōu)勢

利用不同的金屬（金或鎳）可以提高一系列能量的效率必然趨勢。該圖為從ANT波帶片軟件生成的圖像。

高分辨率波帶片可在大范圍的能量范圍內提供的分辨率和效率擴大。18 nm（Δr）分辨率的波帶片提供高分辨率多樣性，水窗效率高于20％。18 nm Au FZP圖像新格局，直徑270μm真諦所在，中心光闌設計。

Applied Nanotool的波帶片可用于各種應用競爭力，包括大直徑的ptychography和幾毫米的<1 nm縫合誤差充分。直徑為0.85毫米的波帶片圖像

高相位對比成像進一步完善，適用于分辨率為50 nm及以下的硬X射線應用。波帶片的均勻性是高相位襯度成像的關鍵組成部份優化服務策略。

軟X-Ray指標

低于5keV(<0.25nm)的X射線通常被歸類為軟X射線關規定，該射線比高能X射線更容易被吸收。通常兩個角度入手，波帶片不需要相同的厚度效率建強保護，并且允許更高分辨率成像。軟/細X射線的一系列波帶板選項可滿足特定要求生產效率。

Device	Outer Zone Width ΔR _n(nm)	Thickness (µm)	Outer Diameter (µm)	(# of zones) E/ΔE Limit	~ Focal Length (µm)	Estimated Lead Time
NZP-50um-12nm	12	0.05 + 0.01	50	1059	144	Please Contact
NZP-65um-15nm	15	0.05 + 0.01	65	1096	235	Please Contact
SZP?90um?15nm	15	<0.1	90	1514	325	2-3
SZP?120um?15nm	15	<0.1	120	2019	433	2-3
SZP?200um?18nm	18	<0.15	200	2797	868	In Stock
SZP?270um?18nm			270	3775	1172
SZP?320um?18nm			320	4473	1389
SZP-200um-25nm	25	<0.24	200	2007	1207	In Stock
SZP?250um?25nm			250	2509	1510
SZP-300um-25nm			300	3010	1811
SZP-360um-25nm			360	3612	2173
TZP?160um?50nm	50	<0.75	160	801	1934	2 – 3
TZP?280um?50nm	50	<0.75	280	1401	3384	2 – 3
TZP?750um?200nm	200	<0.75	750	938	36292	1 – 3
TZP?1250um?200nm	200	<0.75	1250	1563	60487	1 – 3
*For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software.

硬X-Ray指標

高于5-10keV的X射線從柔弱轉變?yōu)橛瞂射線使命責任，在那里它們能夠更好地穿透樣品以提供更好的成像。硬X射線菲涅耳波帶片需要高縱橫比功能使用，以便為5 keV以上的能量提供足夠的效率和分辨率合規意識。我們目前的光學系統(tǒng)可根據所需的能量為亞25 nm – 100 nm成像提供超高分辨率。堆疊硬X射線（通過雙重處理或芯片對準）可以顯著提高我們設備的效率有效性。硬X射線的波帶片選項范圍可用于特定要求創新內容。

Device	Outer Zone Width ΔR _n(nm)	Thickness (µm)	Outer Diameter (µm)	(# of zones) E/ΔE Limit	Energy Range (keV)	Estimated Lead Time (months)
HZP-50-25nm	25	>0.65	50	500	1.5 to 10	2 – 3
HZP-75-25nm	25	>0.65	75	750	1.5 to 10	2 – 3
HZP?100um?42.5nm	42.5	>0.8	100	588	2 to 12	2 – 3
HZP?85um?50nm	50	>0.9	85	425	2 to 12	2 – 3
HZPX?85um?50nm		>1.7	85	425	5.5 to 20	4 – 6
HZP?180um?50nm		>0.9	180	900	2 to 12	2 – 3
HZP?550um?50nm		>0.9	550	2750	2 to 12	2 – 3
HZPX?550um?50nm		>1.5	550	2750	5.5 to 20	4 – 6
HZP-400um-100nm	100	>1.2	400	1000	2.5 to 8	2 – 3
HZPX?400um?100nm	100	>2.6	400	1000	8 to 30	4 – 6
HZP?400um?120nm	120	>1.5	400	834	5 to 25	2 – 3
HZPX?400um?120nm	120	>2.6	400	834	8 to 30	4 – 5
HZP?750um?200nm	200	>2.2	750	938	7 to 20	3 – 4
HZPX?750um?200nm	200	>3.6	750	938	12 to 50	4 – 5
*For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm).

Oxide Interlock process for Hard X-Ray Optics

Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.

Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.

中心光闌

中心光闌和外光闌選項可以顯著改善波帶板成像，降低光學器件的0次級并提高其使用壽命廣泛關註。各種厚度可達3μm的芯片可用或大于10μm作為單獨的芯片善於監督。高分辨率18 nm外區(qū)菲涅耳波帶片頂部電鍍4μm厚中心止點

4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zones

Custom Designs and Frame Size

Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.

Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.

XY Stage for Zone Plates/Central Stop Alignment

Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted.

XY micrometer scale stage holder for central stop and zone plate alignment with blast shield

波帶片計算器

Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).