Retrofit CDSEM S-9380 執(zhí)行原廠新機(jī)器同樣驗(yàn)收技術(shù)指標(biāo)：

提供樣品測(cè)試驗(yàn)證相對開放；

General

Wafer size : 8-inch (200-mm size)

V-notch wafer of SEMI or JEIDA standards is applicable.

CD measurement principle : Cursor and line profile measurement

CD measurement range : 0.05 to 2.0 mm (either line width or hole diameter)

CD measurement reproducibility : ±1% or 0.6 nm (3 sigma), whichever larger

Throughput : due to the data after modification from Hitachi High-Technologies Corporation

Secondary electron image resolution

: 2 nm (at accelerating voltage of 0.8 kV; with

Hitachi’s reference specimen for resolution measurement)

Magnification : SEM image - 1,000′to 300,000′

Optical microscope image - approximay 110x (220x is optional)

升級(jí)：實(shí)驗(yàn)室數(shù)據(jù)上傳接口；